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You have many other brush options for drawing, creating special effects, and so on. Eraser. This tool can be used to clean up a painting by erasing unwanted portions of the image. Rectangle selection. The Rectangle tool enables you to select any area of an image and move it around. It offers many options for moving it in a variety of ways — even moving it around the work area. Transform. The Transform option enables you to distort an image — for example, stretch or shrink it. You can also rotate an object, flip it horizontally or vertically, and change the size of the image. Text. The text tools enable you to add text to an image. Free Transform. The Free Transform tool enables you to stretch or squish an object on your work area. You can also rotate, flip, and distort it as you wish. Fly. You can drag around the image, opening or closing windows that you can use to edit the image. Undo. The Undo feature enables you to reverse previous actions. 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Field of the Invention This invention relates to two-dimensional arrays of diodes and more particularly to a diode and a diode array which minimizes the effects of electrical parasitics created by the electrical connections between the diode and the associated substrate. 2. Description of the Prior Art It is well known that a two-dimensional array of diodes has numerous applications. There are several methods of fabricating a two-dimensional array of diodes. For example, the array may be fabricated by diffusing an N-type region of semiconductor material into a silicon wafer and by depositing a P-type region of semiconductor material over the N-type region thereby reverse biasing the N- and P-type regions. The substrate so fabricated has an N-type region which is contiguous to the P-type region. This N-type region is contacted through an aluminum which surrounds the N-P junction and contacts the P-type region. Then a second P-type region is deposited over the first P-type region and the aluminum to form a new junction, resulting in a diode. In order to drive this diode (which may have a cross section of several microns by several microns) an array of several hundred to several thousand diodes is required. The fabrication of such a large number of diodes is quite difficult because each diode must be electrically contacted. The connection between each diode and the substrate, referred to as the electrical lead, usually adds several microns of length to the diode, which cannot be ignored in a large array of two-dimensional diodes. Also, in order to obtain a reasonable operating voltage, the P-N junction between the first and second P-type regions must be reverse biased. This is also difficult since the reverse bias induces an electrical field on the aluminum junction which can be several volts per micron. As a result, the area of the junction where the aluminum contacts the semiconductor material is quite large. This results in a considerable degradation of the short-channel effect, i.e., a degradation of the current carrying capability of the diode.Welti Welti is a village in northwest Ethiopia. Located in the Arsi Zone of the Oromia Region, Welti has a latitude and longitude of with an elevation of 1470 metres above sea level. It is bounded by Banchacha to the north, Boda to the north What's New In? \begin{aligned} \frac{d}{dt} \boldsymbol{\epsilon} = A(\boldsymbol{\epsilon}) = \left(\begin{array}{cc} \epsilon_\eta & 0\\ 0 & \epsilon_\xi \end{array} \right). \label{eq:error}\end{aligned}$$ On the other hand, it is also possible to formulate the rigid body motion as the trajectory of an error vector with an associated inertial matrix. The rigid body motion can be described by an error vector in the time domain: $$\begin{aligned} \boldsymbol{\epsilon}(t) = \left(\begin{array}{c} \boldsymbol{\xi}(t)-\boldsymbol{\xi}_0\\ \boldsymbol{\eta}(t)-\boldsymbol{\eta}_0 \end{array}\right),\label{eq:error:t}\end{aligned}$$ where $\boldsymbol{\xi}_0,\boldsymbol{\eta}_0$ are the translational and rotational initial conditions. Now, the rigid body motion $\boldsymbol{\xi}(t),\boldsymbol{\eta}(t)$ is equivalent to the linear evolution of $\boldsymbol{\epsilon}(t)$ with $$\begin{aligned} A(\boldsymbol{\epsilon}) = \left(\begin{array}{c} \boldsymbol{\eta}_0^T & \boldsymbol{0}^T\\ -\boldsymbol{\xi}_0^T & \boldsymbol{0}^T \end{array}\right)\left(\begin{array}{c} \boldsymbol{\xi}\\ \boldsymbol{\eta} \end{array}\right), \label{eq:A:st}\end{aligned}$$ where the upper-left $2\times2$ matrix is the inertial matrix. 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